Silicon Tetraacetate

Catalog Number	ACM562903-1
CAS Number	562-90-3
Structure
Molecular Weight	264.26 g/mol
Molecular Formula	C8H12O8Si
Boiling Point	148 °C(6 mmHg)
Flash Point	65 °C
Application	Silicon tetraacetate is utilized primarily for the creation of silicon dioxide thin films through a direct photochemical vapor deposition method It acts as a precursor for forming silicon complexes with monofunctional bidentate Schiff bases and offers an alternative to silicon hydride and alkoxide in the production of low-temperature silicon dioxide Additionally when reacted with ethanol in the absence of water it produces silica gel and ethyl acetate underscoring its role as a sol-gel precursor
Packaging	10 g; 100 g;

Custom Reviews

November 16, 2024

Efficient Precursor for SiO2 Thin Films

Silicon Tetraacetate from Alfa Chemistry proved invaluable in my research. Used for photochemical vapor deposition, it enabled efficient SiO2 film preparation. Simple process and reliable results-highly recommend for low-temp silica production!

※ Please kindly noted that this product is for research use only.