Tetraacetoxysilane

Catalog Number	ACM562903-2
CAS Number	562-90-3
Structure
Molecular Weight	264.26 g/mol
Molecular Formula	C8H12O8Si
Application	Tetraacetoxysilane is primarily utilized in the fabrication of silicon dioxide thin films through a direct photochemical vapor deposition process It serves as a precursor in the synthesis of silicon complexes with specific Schiff bases As a versatile component it provides an alternative approach to the production of silicon dioxide at low temperatures substituting for silicon hydride and alkoxide Additionally when reacted with ethanol in the absence of water it yields silica gel and ethyl acetate Furthermore tetraacetoxysilane is employed in sol-gel processes highlighting its multifaceted role in silicon-based material production
Packaging	10 g; 100 g;

Custom Reviews

November 03, 2024

Highly Efficient for SiO2 Film Preparation

Using Alfa Chemistry's Tetraacetoxysilane significantly streamlined our thin film production. Its reactivity with ethanol for silica gel formation was particularly impressive for our sol-gel research, enhancing efficiency and simplifying processes.

※ Please kindly noted that this product is for research use only.