Titanium Silicide

Catalog Number	ACMA00022590
Application	Titanium Silicide serves as a crucial material in CMOS integrated circuits primarily utilized in forming source gate and drain contacts as well as local interconnections It is effectively applied in the C54 phase which enhances its performance in these roles
Packaging	10 g; 100 g;

Custom Reviews

2024-9-23

Exceptional Quality for CMOS Applications

I've used Alfa Chemistry's Titanium Silicide in my research on CMOS integrated circuits Its efficacy as source gate and drain contacts in the C54 phase is impressive resulting in reliable local interconnections Highly recommended for advanced semiconductor projects

※  Please kindly noted that this product is for research use only.

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