2,2,3,3-Tetramethyl-2,3-disilabutane

Catalog Number	ACMA00022175
Molecular Weight	146.38 g/mol
Molecular Formula	C6H18Si2
Application	2233-Tetramethyl-23-disilabutane serves as a versatile chemical reagent with multiple applications in various industrial processes It acts as a critical agent in silylation reactions effectively transforming compounds such as allylic acetates aryl halides and diketones Additionally it is a valuable precursor material for vapor deposition particularly in the growth of silicon carbide which is essential in electronics and semiconductor manufacturing The compound also plays a significant role in facilitating the synthesis of trimethylsilane derivatives using metals like sodium potassium and lithium Moreover it is employed in catalytic processes involving palladium and rhodium complexes enabling transformations such as the replacement of aromatic nitriles with trimethylsilyl groups and the homocoupling of arenesulfonyl chlorides As a solvent it is instrumental in the borylation of fluoroaromatics and it reacts with alkynes to form siloles Furthermore it is involved in the silylation of acid chlorides to produce acylsilanes highlighting its multifaceted utility in both chemical synthesis and advanced material preparation
EC Number	-

Custom Reviews

November 13, 2024

Essential Reagent in Silicon-Based Research

I've used 2,2,3,3-Tetramethyl-2,3-disilabutane from Alfa Chemistry in my silicon carbide growth research. Its stability and performance are remarkable, facilitating high-quality results in vapor deposition experiments. Highly recommended for industry applications.

※ Please kindly noted that this product is for research use only.