Catalog Number | ACM3555473 |
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CAS Number | 3555-47-3 |
Structure | |
Synonyms | Tetrakis-trimethylsilyloxy-silan; Tetrakis(trimethylsiloxy)silane; 1,1,1,5,5,5-hexamethyl-3,3-bis-trimethylsilanyloxy-trisiloxane; Tetrakis-trimethylsiloxy-silan; 3.3-Bis-trimethylsiloxy-hexamethyltrisiloxan; Orthokieselsaeure-tetrakis-trimethylsilylester; 1,1,1,5,5,5-Hexamethyl-3,3-bis-trimethylsilyloxy-trisiloxan; |
IUPAC Name | tetrakis(trimethylsilyl)silicate |
Molecular Weight | 384.84 g/mol |
Molecular Formula | C12H36O4Si5 |
Canonical SMILES | C[Si](C)(C)O[Si](O[Si](C)(C)C)(O[Si](C)(C)C)O[Si](C)(C)C |
InChI Key | VNRWTCZXQWOWIG-UHFFFAOYSA-N |
Boiling Point | 284.4 °C(760 mmHg) |
Melting Point | -60 °C |
Flash Point | 117.4 °C |
Purity | 0.98 |
Density | 0.893 g/mL |
Appearance | Transparent liquid |
Application | Tetrakis(Trimethylsiloxy)Silane is an organosilicon compound primarily used as a precursor in the synthesis of nanostructured organosilicon polymer films through plasma-enhanced chemical vapor deposition (PECVD) at atmospheric pressure Additionally it serves a crucial role in the production of low dielectric constant SiCOH films when used in combination with cyclohexane utilizing the PECVD method |
Storage | Ambient temperatures. |
EC Number | 222-613-4 |
Exact Mass | 384.14600 |
Packaging | 10 g; 100 g; |
※ Please kindly noted that this product is for research use only.